Work

Dielectric properties of thin films of aluminium oxide and silicon oxide

Year: 1968

Type: article

Source: Thin Solid Films

DOI: 10.1016/0040-6090(68)90002-3

Authors: F. Argall, A.K. Jonscher

Institution: University of London

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1980445141

FWCI: 19.79

Cites: 22

Cited by: 259

Related to: 10