Work

Wafer shape compensation at the track PEB for improved CD uniformity

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.772894

Authors: Timothy Michaelson, Junyan Dai, Lu Chen, Hiram Cervera, Brian Lue, Harald Herchen, Kim Vellore, Nikolaos Bekiaris

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1980990277

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