Work

AFM microlithography of a thin chromium film covered with a thin resist Langmuir-Blodgett (LB) film

Year: 1996

Type: article

Source: Thin Solid Films

DOI: 10.1016/0040-6090(95)06794-9

Authors: Hajime Takano, Masamichi Fujihira

Institution: Tokyo Institute of Technology

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Education, Culture, Sports, Science and Technology

OpenAlex ID: W1981201334

FWCI: 1.655

Cites: 31

Cited by: 14

Related to: 10