Work

Far-infrared absorption of silicon crystals

Year: 1988

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.341325

Authors: Tetsuhiko Ohba, Shun-ichi Ikawa

Institution: Hokkaido University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1981277188

FWCI: 1.035

Cites: 10

Cited by: 55

Related to: 10