Work

Chemical patterning of sub-50-nm half pitches via nanoimprint lithography

Year: 2005

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2004.12.085

Authors: Sunggook Park, Sina Saxer, Celestino Padeste, Harun H. Solak, Jens Gobrecht, Helmut Schift

Institution: Paul Scherrer Institute

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Office of Science

OpenAlex ID: W1981352568

FWCI: 1.175

Cites: 12

Cited by: 13

Related to: 10