Residual stress analysis of SiO2 films deposited by plasma-enhanced chemical vapor deposition
Year: 2000
Type: article
Source: Surface and Coatings Technology
Institutions: Sungkyunkwan University, Chonnam National University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1983265996