Work

Dielectric breakdown I: A review of oxide breakdown

Year: 1996

Type: article

Source: Microelectronics Journal

DOI: 10.1016/0026-2692(95)00104-2

Authors: J.F. Verweij, J.H. Klootwijk

Institution: University of Twente

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W1985162339

FWCI: 0.466

Cites: 28

Cited by: 138

Related to: 10