Work

Tetraoxaspiroalkanes for polymerization stress reduction of Silorane resins

Year: 2008

Type: article

Source: Journal of Applied Polymer Science

DOI: 10.1002/app.27346

Authors: Cecil C. Chappelow, Charles S. Pinzino, Shin‐Shi Chen, Shiva P. Kotha, Alan G. Glaros, J. David Eick

Institutions: MRIGlobal, University of Missouri–Kansas City, Kansas City University

Language: English

Topic: Silicone and Siloxane Chemistry

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1985807544

FWCI: 0.509

Cites: 30

Cited by: 12

Related to: 10