Work

Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

Year: 1998

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(98)00076-8

Authors: H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamazaki, K. Kurihara

Institutions: NTT (Japan), NTT Basic Research Laboratories

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1985976503

FWCI: 3.725

Cites: 6

Cited by: 167

Related to: 10