Work

Film Thickness Dependence of Mobility in Deposited Tellurium Films

Year: 1979

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.18.1397

Authors: Yoshizumi Yasuoka, Toyoo Miyata

Institution: National Defence Academy

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W1985994760

FWCI:

Cites:

Cited by: 4

Related to: 10