Elucidating the Photoresponse of Ultrathin MoS 2 Field-Effect Transistors by Scanning Photocurrent Microscopy
Year: 2013
Type: article
Abstract: The mechanisms underlying the intrinsic photoresponse of few-layer (FL) molybdenum disulfide (MoS 2 ) field-effect transistors are investigated via scanning photocurrent microscopy. We attribute the locally enhanced photocurrent to band-bending-assisted separation of photoexcited carriers at the MoS 2 /Au interface. The wavelength-dependent photocurrents of FL MoS 2 transistors qualitatively follow the optical absorption spectra of MoS 2, providing direct evidence of interband photoexcitation. Time and spectrally resolved photocurrent measurements at varying external electric fields and carrier concentrations establish that drift-diffusion currents dominate photothermoelectric currents in devices under bias.
DOI: 10.1021/jz401199x
Authors: Chung-Chiang Wu, Deep Jariwala, Vinod K. Sangwan, Tobin J. Marks, Mark C. Hersam, Lincoln J. Lauhon
Institution: Northwestern University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W1986326157
