Work

Process models for ultra-shallow junction technologies

Year: 1987

Type: conference-paper

Source: Technical digest - International Electron Devices Meeting/Technical digest

DOI: 10.1109/iedm.1987.191404

Author: R.B. Fair

Institutions: Duke University, MCNC Research and Development Institute

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1986715801

FWCI: 1.216

Cites: 3

Cited by: 3

Related to: 10