Work

Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin

Year: 2008

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.2835087

Authors: Jeffrey W. Elam, David A. Baker, Alexander J. Hryn, Alex B. F. Martinson, Michael J. Pellin, Joseph T. Hupp

Institutions: Argonne National Laboratory, Northwestern University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1987345373

FWCI: 5.082

Cites: 42

Cited by: 201

Related to: 10