Comprehensive characterization of copper indium disulfide thin film
Year: 1999
Type: conference-paper
DOI: 10.1117/12.367558
Authors: Richard Mu, Don O. Henderson, Akira Ueda, Marvin H. Wu, Johnathan Bennett, M. A. M. Paliza, M. B. Huang, J. Keay, Leonard C. Feldman, K. C. Kwiatkowski, C. M. Lukehart, Jennifer Hollingsworth, W. E. Buhro, J. Harris, E. Gordon, A. Hepp
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1987538967
