Work

t-Boc protected poly(p-hydroxystyrene-alt-carbon monoxide): a new class of deep-UV resists

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.210371

Authors: M. S. Brookhart, Joseph M. DeSimone, Robert E. Johnson, Shonali Tahiliani

Institutions: University of North Carolina at Chapel Hill, Celanese (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W1987785489

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