Work

Fabrication of graphite masks for deep and ultradeep x-ray lithography

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.395599

Authors: Yohannes M. Desta, Georg Aigeldinger, Kevin J. Zanca, Philip J. Coane, Jost Goettert, Michael C. Murphy

Institutions: Louisiana State University, Louisiana Tech University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1988094674

FWCI: 1.911

Cites: 9

Cited by: 13

Related to: 10