Work

Reflection masks for soft x-ray projection lithography

Year: 1992

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.51273

Authors: Andrew M. Hawryluk, Natale M. Ceglio, D. W. Phillion, David P. Gaines, Raymond Browning, Roger Fabian W. Pease, Diane K. Stewart, Nicholas P. Economou

Institutions: Lawrence Livermore National Laboratory, Stanford University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1988129760

FWCI:

Cites:

Cited by: 2

Related to: 10