Work

Proximity printing by wave-optically designed masks

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.451293

Authors: Frank Wyrowski, Ernst-Bernhard Kley, Sven Buehling, Ton J. Nellissen, Lingli Wang, Maarten Dirkzwager

Institutions: Friedrich Schiller University Jena, LightTrans (Germany), Philips (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1990277699

FWCI: 1.868

Cites:

Cited by: 7

Related to: 10