Work

Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns

Year: 2001

Type: article

Abstract: As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.

Source: Physical Review A

DOI: 10.1103/physreva.63.063407

Authors: Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel L. Braunstein, Jonathan P. Dowling

Institutions: Bangor University, California Institute of Technology, Jet Propulsion Laboratory

Language: English

Topic: Quantum Information and Cryptography

Subfield: Artificial Intelligence

Field: Computer Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W1992182803

FWCI: 11.31

Cites: 11

Cited by: 127

Related to: 10