Work

Atomic Layer Deposition of Indium Tin Oxide Thin Films Using Nonhalogenated Precursors

Year: 2008

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/jp7097312

Authors: Jeffrey W. Elam, David A. Baker, Alex B. F. Martinson, Michael J. Pellin, Joseph T. Hupp

Institutions: Northwestern University, Argonne National Laboratory

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1992400074

FWCI: 5.68

Cites: 23

Cited by: 115

Related to: 10