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Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.686732

Authors: Daniel Sullivan, Yusuke Okawa, Kazuhiko Sugawara, Zdenek Benes, Jun Kotani

Institutions: IBM (United States), Toppan (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1992713239

FWCI:

Cites:

Cited by: 2

Related to: 10