Work

Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films

Year: 2013

Type: article

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.26.55

Authors: Hiroshi Yoshida, Hyo Seon Suh, Abelardo Ramirez-Herunandez, Jeong In Lee, Kouhei Aida, Lei Wan, Yoshihiko Ishida, Yasuhiko Tada, Ricardo Ruiz, Juan de Pablo, Paul F. Nealey

Institutions: Hitachi (Japan), University of Chicago, University of Wisconsin–Madison, Western Digital (United States)

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W1992886564

FWCI: 4.961

Cites: 12

Cited by: 60

Related to: 10