Controlling line-edge roughness and reactive ion etch lag in sub-150 nm features in borophosphosilicate glass
Year: 2007
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.2717141
Authors: Parijat Bhatnagar, Siddhartha Panda, Nikki L. Edleman, Scott D. Allen, Richard Wise, Arpan Mahorowala
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1994863929