Work

Advances in lithography: introduction to the feature

Year: 2014

Type: article

Source: Applied Optics

DOI: 10.1364/ao.53.000li1

Authors: Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce Smith

Institutions: Fraunhofer Institute for Integrated Systems and Device Technology, University of Arizona, KLA (United States), Rochester Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1994951575

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