Work

The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor

Year: 2008

Type: article

Source: Journal of the American Chemical Society

DOI: 10.1021/ja078202j

Authors: Arunkumar Panneerselvam, Mohammad. A. Malik, Mohammad Afzaal, Paul O'Brien, Madeleine Helliwell

Institution: University of Manchester

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1995083814

FWCI: 6.839

Cites: 25

Cited by: 218

Related to: 10