Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
Year: 2005
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.1940727
Author: Riikka L. Puurunen
Institutions: IMEC, VTT Technical Research Centre of Finland, KU Leuven
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1995191254