Work

Extreme ultraviolet lithography: A review

Year: 2007

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2794048

Authors: Banqiu Wu, Ajay Kumar

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1995660891

FWCI: 18.9

Cites: 216

Cited by: 401

Related to: 10