Work

Influence of preamorphization on the structural properties of ultrashallow arsenic implants in silicon

Year: 2006

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.2363252

Authors: L. Capello, T. H. Metzger, M. Werner, J. A. van den Berg, M. Servidori, L. Ottaviano, C. Bongiorno, G. Mannino, T. Feudel, M. Herden, V. Holý

Institutions: Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Structure et Propriétés d'Architectures Moléculaires, University of Salford, National Research Council, Institute for Microelectronics and Microsystems, Charles University

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: European Synchrotron Radiation Facility, Engineering and Physical Sciences Research Council

Award: G1795436972

OpenAlex ID: W1996407579

FWCI: 0.386

Cites: 24

Cited by: 4

Related to: 10