Work

Cpk applications—Uses and abuses

Year: 1991

Type: article

Source: Microelectronics Reliability

DOI: 10.1016/0026-2714(91)90301-m

Authors: R.P. Anjard, D. Hagerty, G.K. Griffith, Shin-Ta Liu, E.M. Mustonen, D.A. Pasfield

Language: English

Topic: Advanced Statistical Process Monitoring

Subfield: Statistics, Probability and Uncertainty

Field: Decision Sciences

Domain: Social Sciences

Open Access status: closed

OpenAlex ID: W1997622208

FWCI:

Cites: 7

Cited by: 5

Related to: 10