Work

Adsorption of Si atom on H-terminated Si(0 0 1)-2 × 1 surface

Year: 2003

Type: article

Source: Applied Surface Science

DOI: 10.1016/s0169-4332(03)00481-1

Authors: Tomihiro Hashizume, Hiroshi Kajiyama, Yuji Suwa, Seiji Heike, S. Matsuura, Jun Nara, Takahisa Ohno

Institutions: Hitachi (Japan), The University of Tokyo, National Institute for Materials Science

Language: English

Topic: Surface and Thin Film Phenomena

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Education, Culture, Sports, Science and Technology

OpenAlex ID: W1997775550

FWCI: 0.422

Cites: 21

Cited by: 7

Related to: 10