High aspect ratio silicon etch: A review
Year: 2010
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.3474652
Authors: Banqiu Wu, Ajay Kumar, Sharma Pamarthy
Institution: Applied Materials (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1997913942