Work

Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer

Year: 2007

Type: review

Source: Nano Letters

DOI: 10.1021/nl070924l

Authors: Yeon Sik Jung, C. A. Ross

Institution: Massachusetts Institute of Technology

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1998009021

FWCI: 0.783

Cites: 29

Cited by: 462

Related to: 10