Work

Product-wafer focus-exposure monitor for advanced flash memory

Year: 2004

Type: conference-paper

Source: IEEE International Conference on ASIC (ASICON)

DOI: 10.1109/issm.2003.1243300

Authors: S. Hannon, H. Kennemer, K. Monahan, B. Eichelberger, B. Dinu, C. Nelson, H. Pedut

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W199808427

FWCI: 0.414

Cites: 4

Cited by: 1

Related to: 10