Work

Layer-by-Layer Assembly of a Metallomesogen by Dip-Pen Nanolithography

Year: 2013

Type: article

Source: ACS Nano

DOI: 10.1021/nn306013e

Authors: Boya Radha, Guoliang Liu, Daniel J. Eichelsdoerfer, Giridhar U. Kulkarni, Chad A. Mirkin

Institutions: Northwestern University, Jawaharlal Nehru Centre for Advanced Scientific Research, International Institute for Nanotechnology

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Indo-US Science and Technology Forum, National Defense Science and Engineering Graduate

OpenAlex ID: W1998260512

FWCI: 2.836

Cites: 49

Cited by: 27

Related to: 10