Work

Resolution enhancement through three color photolithography

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2084451

Authors: Zuleykhan Tomova, John T. Fourkas

Institution: University of Maryland, College Park

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Division of Civil, Mechanical and Manufacturing Innovation

OpenAlex ID: W1998592917

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Cites: 17

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Related to: 10