Work

Photoresists for CO 2 -based next-generation microlithography

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.599565

Authors: Mary Kate Boggiano, Colin Wood, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W1999498416

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