Work

Anisotropic high aspect ratio etch for perfluorcyclobutyl polymers with stress relief technique

Year: 2006

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.2382945

Authors: Nazli Rahmanian, Seunghyun Kim, Gregory P. Nordin

Institutions: University of Alabama in Huntsville, Brigham Young University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Defense Advanced Research Projects Agency

OpenAlex ID: W2000869589

FWCI: 0.337

Cites: 15

Cited by: 2

Related to: 10