Work

Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry

Year: 2008

Type: article

Abstract: As easy as “shake and bake”, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100 nm features to be fabricated.

Source: Advanced Materials

DOI: 10.1002/adma.200800330

Authors: Luis M. Campos, Ines Meinel, Rosette G. Guino, Martin Schierhorn, Nalini Gupta, Galen D. Stucky, Craig J. Hawker

Institutions: University of California, Santa Barbara, Mitsubishi Corporation (United States)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

Funders: National Science Foundation, University of California, Santa Barbara, Materials Research Science and Engineering Center, Harvard University, Division of Materials Research, Division of Chemistry

Awards: Highly Efficient and Versatile Synthesis of Polymeric Materials using Click Chemistry, G2186511393, G7926269928, MRSEC: Materials Research Science and Engineering Center at UCSB, G920527201

OpenAlex ID: W2002825909

FWCI: 14.58

Cites: 28

Cited by: 212

Related to: 10