Work

Integrating proximity effect corrections with photomask data preparation

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.209251

Authors: Oberdan W. Otto, Richard C. Henderson

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004114672

FWCI: 5.164

Cites:

Cited by: 7

Related to: 10