Work

Characterization of Dopamine−Melanin Growth on Silicon Oxide

Year: 2009

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/jp901188h

Authors: Falk Bernsmann, Arnaud Ponche, Christian Ringwald, Joseph Hemmerlé, Jesus Raya, Burkhard Bechinger, Jean-Claude Voegel, Pierre Schaaf, Vincent Ball

Institutions: Centre National de la Recherche Scientifique, Inserm, Institut de Chimie de Strasbourg, Université de Strasbourg

Language: English

Topic: melanin and skin pigmentation

Subfield: Cell Biology

Field: Biochemistry, Genetics and Molecular Biology

Domain: Life Sciences

Open Access status: closed

OpenAlex ID: W2004596148

FWCI: 5.53

Cites: 35

Cited by: 346

Related to: 10