Work

Planar magnetron sputtering

Year: 1978

Type: article

Source: Journal of Vacuum Science and Technology

DOI: 10.1116/1.569451

Author: Robert K. Waits

Institution: Hewlett-Packard (United States)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004691564

FWCI: 8.346

Cites: 48

Cited by: 249

Related to: 10