Year: 2003
Type: article
Abstract: Patterning resists by molding with a stamp opens ways for the mass-fabrication of nanostructures. The versatility of nano-imprint lithography can be greatly enhanced when copies of valuable stamp originals can be made. For the stamp copying itself we are using nano-imprint, making it possible to generate structures with inverse profiles and different depths. By considering the nanorheological behavior we were able to successfully fabricate various stamp copies for different designs.
Authors: Helmut Schift, Sunggook Park, Jens Gobrecht
Institution: Paul Scherrer Institute
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W2006215044