Work

Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part I–Modeling and Simulation Method

Year: 2013

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2013.2283518

Authors: Xiaobo Jiang, Runsheng Wang, Tao Yu, Jiang Chen, Ru Huang

Institution: Peking University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007236626

FWCI: 2.794

Cites: 24

Cited by: 43

Related to: 10