Work

Fabrication of submicrometer CMOS circuits using a new trilayer photolithographic process

Year: 1987

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/edl.1987.26675

Authors: J.Y. Lee, H.L. Garvin, G. Hagen, R.C. Henderson

Institution: HRL Laboratories (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007362480

FWCI: 0.514

Cites: 9

Cited by: 2

Related to: 10