Ultrathin SiO2 interface layer growth
Year: 2010
Type: conference-paper
Authors: M. J. Bevan, R. Curtis, T. Guarini, W. Liu, S. C. H. Hung, H. Graoui
Institution: Applied Materials (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2007480012