Work

Structure, Chemistry, and Electrical Performance of Silicon Oxide-Nitride-Oxide Stacks on Silicon

Year: 2004

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.1811594

Authors: Igor Levin, Mark Kovler, Yakov Roizin, Menachem Vofsi, Richard D. Leapman, Gary Goodman, Norio Kawada, Munabu Funahashi

Institutions: National Institute of Standards and Technology, Tower Semiconductor (Israel), National Institutes of Health, Rigaku (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007861189

FWCI: 1.953

Cites: 14

Cited by: 14

Related to: 10