Work

Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing

Year: 2014

Type: article

Source: ACS Macro Letters

DOI: 10.1021/mz500705q

Authors: Su-Mi Hur, Gurdaman S. Khaira, Abelardo Ramírez-Hernández, Marcus Müller, Paul F. Nealey, Juan J. de Pablo

Institutions: Argonne National Laboratory, University of Chicago, University of Göttingen

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: European Commission, Basic Energy Sciences

Award: Computational Lithography for Directed Self-Assembly: Materials, Models and Processes

OpenAlex ID: W2008013444

FWCI: 4.236

Cites: 42

Cited by: 79

Related to: 10