Work

Review of inductively coupled plasmas for plasma processing

Year: 1992

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/0963-0252/1/2/006

Author: J Hopwood

Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008225124

FWCI: 18.08

Cites: 27

Cited by: 709

Related to: 10