Work

The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces

Year: 2002

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/0963-0252/11/1/303

Authors: Annemie Bogaerts, Renaat Gijbels

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2008490556

FWCI: 3.439

Cites: 26

Cited by: 70

Related to: 10