Work

Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist charging

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.793076

Authors: Noriyuki Kobayashi, Kazuya Goto, Tetsuro Wakatsuki, Tadashi Komagata, Yasutoshi Nakagawa

Institutions: JEOL (Japan), JEOL (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2011222136

FWCI:

Cites:

Cited by: 6

Related to: 10